| 摘要 |
<p>A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source (2) from propagating with radiation from the radiation source (2) into or within a lithographic apparatus. The debris prevention system includes an aperture (3) that defines a maximum emission angle (E) of the radiation coming from the radiation source (2), and a first debris barrier (4, 4') having a radiation transmittance. The first debris barrier (4. 41) includes a rotatable foil trap. The debris prevention system also includes a second debris barrier (5) that has a radiation transmittance. The first debris barrier (4, 4') is configured to cover a part of the emission angle and the second debris barrier (5) is configured to cover another part of the emission angle (Θ).</p> |
