| 摘要 |
PURPOSE: An etching solution is provided to improve the reliability and yield of a liquid crystal display while not damaging the other metal layer except for copper exposed to the etchant. CONSTITUTION: An etching solution for selectively etching a multilayer containing copper(copper alloy)/titanium, molybdenum or molybdenum alloy layer, and a copper or copper alloy layer form a copper or copper alloy monolayer. The etching solution comprises 5~20 weight% hydrogen peroxide liquid, 1~5 weight% phosphoric acid, 0.1~5 weight phosphoric acid, 0.1~10 weight% chelating agent, 0.1~5 weight% annular amine, and 0.1 ~ 5 weight% cyclic amine compound, and the amount to be 100 weight% of the whole composition.
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