| 发明名称 |
Phenolic/alicyclic copolymers and photoresists |
| 摘要 |
The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
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| 申请公布号 |
US7700256(B2) |
申请公布日期 |
2010.04.20 |
| 申请号 |
US20020313954 |
申请日期 |
2002.12.06 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
BARCLAY GEORGE G.;PANDYA ASHISH;YUEH WANG;ZAMPINI ANTHONY;TENG GARY GANGHUI;MAO ZHIBIAO |
| 分类号 |
G03F7/004;C07C69/00;C07C69/013;C07C69/54;C08K5/00;C08L33/08;C08L33/10;C08L101/08;G03F7/039;G03F7/30 |
主分类号 |
G03F7/004 |
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