发明名称 Integrated circuit structure and manufacturing method thereof
摘要 An integrated circuit structure is described, and includes a substrate, a contact window, and a Schottky contact metal layer. A heavily doped region and a lightly doped region are formed in the substrate. The contact window is disposed above the heavily doped region, and the Schottky contact metal layer is disposed above the lightly doped region. The Schottky contact metal layer and the substrate form a Schottky diode. The material of the contact window is different from that of the Schottky contact metal layer.
申请公布号 US7701031(B2) 申请公布日期 2010.04.20
申请号 US20060399844 申请日期 2006.04.07
申请人 UNITED MICROELECTRONICS CORP. 发明人 CHENG CHAOHUA
分类号 H01L29/47 主分类号 H01L29/47
代理机构 代理人
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