发明名称 |
Apparatus and method of treating exhaust gas |
摘要 |
An exhaust gas treating apparatus 1 includes; a case body 2 and a plasma producing means 3 capable of producing plasma inside the case body 2 and treats the substances to be treated contained in the exhaust gas by the plasma producing means 3. The plasma producing means 3 has one or more each of a pulse electrode 4 and a ground electrode 5 that are oppositely disposed in the case body 2 and has a pulse power source 6 capable of feeding a pulse current to the pulse electrode 4 by switching frequency and/or voltage for different values at predetermined time intervals. The substances to be treated contained in the exhaust gas can selectively be treated by switching frequency and/or voltage value for different values at predetermined time intervals so that plasma of a kind adequate for the substances to be treated contained in an exhaust gas is produced between the pulse electrode 4 and the ground electrode 5.
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申请公布号 |
US7700051(B2) |
申请公布日期 |
2010.04.20 |
申请号 |
US20050562597 |
申请日期 |
2005.12.21 |
申请人 |
NGK INSULATORS, LTD.;HONDA MOTOR CO., LTD. |
发明人 |
MIYAIRI YUKIO;FUJIOKA YASUMASA;MASUDA MASAAKI;HATANO TATSUHIKO;SAKUMA TAKESHI;IMANISHI YUUICHIRO;IWAMA KEIZO;DOSAKA KENJI |
分类号 |
B01J19/08;B01D53/32;B01D53/92;F01N3/08 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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