发明名称 Apparatus and method of treating exhaust gas
摘要 An exhaust gas treating apparatus 1 includes; a case body 2 and a plasma producing means 3 capable of producing plasma inside the case body 2 and treats the substances to be treated contained in the exhaust gas by the plasma producing means 3. The plasma producing means 3 has one or more each of a pulse electrode 4 and a ground electrode 5 that are oppositely disposed in the case body 2 and has a pulse power source 6 capable of feeding a pulse current to the pulse electrode 4 by switching frequency and/or voltage for different values at predetermined time intervals. The substances to be treated contained in the exhaust gas can selectively be treated by switching frequency and/or voltage value for different values at predetermined time intervals so that plasma of a kind adequate for the substances to be treated contained in an exhaust gas is produced between the pulse electrode 4 and the ground electrode 5.
申请公布号 US7700051(B2) 申请公布日期 2010.04.20
申请号 US20050562597 申请日期 2005.12.21
申请人 NGK INSULATORS, LTD.;HONDA MOTOR CO., LTD. 发明人 MIYAIRI YUKIO;FUJIOKA YASUMASA;MASUDA MASAAKI;HATANO TATSUHIKO;SAKUMA TAKESHI;IMANISHI YUUICHIRO;IWAMA KEIZO;DOSAKA KENJI
分类号 B01J19/08;B01D53/32;B01D53/92;F01N3/08 主分类号 B01J19/08
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