| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve improvement in throughput in relation to a scanning exposure. <P>SOLUTION: An exposure apparatus includes: a mask-moving section (MS) which is movable in a first direction (X direction) while holding a mask (M) formed with a pattern; an illumination system (IL1, IL2) which forms a first illumination area (IR1) and a second illumination area (IR2) separated from each other by a spacing distance in the first direction; a substrate-moving section (WS) which is movable in a second direction (X direction) while holding a photosensitive substrate (W); a projection optical system (PL) which forms a first projected image of the pattern of the first illumination area and a second projected image of the pattern of the second illumination area; and a restricting section (MB, MD, CR) which restricts the first projected image and the second projected image to be within a first projection area (ER1) and a second projection area (ER2), respectively. A spacing distance, in the first direction, between a first conjugate area conjugate with the first projection area and a second conjugate area conjugate with the second projection area is set to be such a spacing distance that scanning exposures are sequentially performed for a first transfer area and a second transfer area, respectively, which are provided adjacently in the second direction. <P>COPYRIGHT: (C)2010,JPO&INPIT |
