发明名称 APPARATUS AND METHOD FOR Z-LOCATION DEPENDENT X-RAY BEAM FILTRATION FOR IMAGING SYSTEM
摘要 <p><P>PROBLEM TO BE SOLVED: To minimize radiation exposure to a subject by minimizing noise variation across a combined image when images acquired using a plurality of alternately irradiating radiation sources to form an overlapping area are combined. <P>SOLUTION: The imaging system (10) includes at least two X-ray sources (40, 42), an X-ray detector assembly (20) and an attenuation filter (100). The at least two X-ray sources (40, 42) are displaced along a z-axis (52) and configured to alternately emit X-ray beams (24, 25). The X-ray detector assembly (20) is configured to detect the X-ray beams (24, 25). The attenuation filter (100) is mounted proximate the at least two X-ray sources (40, 42) and is configured to provide different amounts of X-ray attenuation to the X-ray beams (24, 25) along the z-axis (52). <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010082442(A) 申请公布日期 2010.04.15
申请号 JP20090223610 申请日期 2009.09.29
申请人 GENERAL ELECTRIC CO 发明人 LI BAOJUN;TOTH THOMAS L;HSIEH JIANG
分类号 A61B6/03 主分类号 A61B6/03
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