| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum processing device of which maintenance is easily conducted by opening a vacuum vessel. Ž<P>SOLUTION: The vacuum processing device includes: a vessel body for structuring a ceiling part and side wall part of the vacuum vessel; a bottom plate part of the vacuum vessel detachably arranged on the vessel body and provided with a mounting base for mounting a substrate; a gas supply mechanism arranged on the ceiling part of the vacuum vessel and supplying processing gas to the substrate mounted on the mounting base; a support body for supporting the vessel body on a floor surface on which the vacuum processing device is arranged; a lifting part for lifting the bottom plate part between an upper position for mounting the bottom plate part on the vessel body and a lower position on a lower side of the vessel body; and a moving body which mounts the lifting part and moves along the floor surface. Trouble in removal operation of processing gas and liquid material in a pipeline, which is required in removing the ceiling part from the vacuum vessel, is omitted to facilitate maintenance. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
|
