| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a capacitor device capable of manufacturing a capacitor device having a high capacitance and ensuring an insulating resistance. <P>SOLUTION: The method includes: a through-hole forming step of forming through-holes 470P and 470G in a capacitor stack 450 including a plurality of stacked capacitors 350a, 350b, and 350c; a desmear step of performing dry desmear processing on the through-holes 470P and 470G after the through-hole forming step; and a seed metal forming step of forming a seed metal by the dry method in the through-holes 470P and 470G after the desmear step. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
