| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold for nano-imprinting which is improved in throughput and can be released smoothly from a substrate in nanoimprint processing. SOLUTION: The mold 100 for nano-imprinting which is produced by cutting has a plurality of minute linear projections 5, wherein the average height of the projections 5 is 50-2,000 nm, the inclination angles of the projections 5 are 20-50°, and the average distance between the apexes of the adjacent projections 5 is 200-2,000 nm. COPYRIGHT: (C)2010,JPO&INPIT |
