发明名称 ION BEAM EXTRACTION BY DISCRETE ION FOCUSING
摘要 <p>An apparatus (900) and methods are disclosed for ion beam extraction. In an implementation, the apparatus includes a plasma source (or plasma) (802) and an ion extractor (804). The plasma source is adapted to generate ions and the ion extractor is immersed in the plasma source to extract a fraction of the generated ions. The ion extractor is surrounded by a space charge (810) formed at least in part by the extracted ions. The ion extractor includes a biased electrode (806) forming an interface with an insulator (808). The interface is customized to form a strongly curved potential distribution (812) in the space-charge surrounding the ion extractor. The strongly curved potential distribution focuses the extracted ions towards an opening (814) on a surface of the biased electrode thereby resulting in an ion beam.</p>
申请公布号 WO2010040805(A1) 申请公布日期 2010.04.15
申请号 WO2009EP63101 申请日期 2009.10.08
申请人 DANMARKS TEKNISKE UNIVERSITET;STAMATE, EUGEN 发明人 STAMATE, EUGEN
分类号 H01J27/02;H01J37/08 主分类号 H01J27/02
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