EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To improve overlapping accuracy in a half-shot process.

SOLUTION: An exposure apparatus has a control means, which controls an illumination means to expose a first shot region of a substrate by determining a first region of an original as an effective region and move a substrate stage such that an overlapping region in the first region with the first shot region is rendered into a half of the first region, which controls the illumination means to expose the first shot region by determining part of the region in the overlapping region including an alignment mark and which controls the illumination means to expose a second shot region of the substrate by determining a region other than the overlapping region of the first region as an effective region.

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