| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist protective film material for immersion lithography, the material excellent in liquid repelling properties and alkali solubility. <P>SOLUTION: The resist protective film composition for immersion lithography contains a repeating unit (A1) formed by cyclopolymerization of a compound expressed by formula (a1), preferably a repeating unit (A2) formed by cyclopolymerization of a compound expressed by formula (a2). The formulae are (a1):CF<SB>2</SB>=CFCF<SB>2</SB>CH(C(O)OZ)(CH<SB>2</SB>)<SB>n</SB>CR=CHR and (a2):CF<SB>2</SB>=CFCF<SB>2</SB>CH(C(O)OZ)CH<SB>2</SB>CH=CH<SB>2</SB>, wherein Z represents a 3C-20C organic group and having at least one group expressed by the formula of -C(CF<SB>3</SB>)<SB>2</SB>OH; n is 0, 1 or 2; and R represents a hydrogen atom or a 1C-20C monovalent organic group, and two of R may be identical or different from each other. <P>COPYRIGHT: (C)2010,JPO&INPIT |
