| 摘要 |
PURPOSE: A three phase mask and a method for manufacturing a semiconductor device using the same are provided to prevent misalignment between a hole and a trench by forming the hole and the trench at the same time using one the three phase mask. CONSTITUTION: A first transmission unit(102) transmits light entirely. A second transmission unit(104,106) transmits a part of the light. A block unit(100) blocks the transmission of the light and surrounds the first and second transmission units. An insulation layer is formed on the upper side of the semiconductor substrate. |
