APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES
摘要
An apparatus for removing volatile residues from a substrate is provided. In one embodiment, an apparatus for removing halogen-containing residues from a substrate includes a chamber suitable for operating maintaining a vacuum therein and a heat module positioned to heat a substrate disposed in the chamber. The apparatus for removing halogen-containing residues from a substrate also includes at least one of A) a temperature controlled pedestal having a projection extending radially therefrom suitable for supporting the temperature control pedestal on a ledge of the chamber body, the projection thermally isolating the base from the chamber body; B) a pair of substrate holders that include two support flanges extending radially inward from an inner edge of an arc-shaped body, each support flange having a substrate support step that includes a sloped landing; or C) a domed window.
申请公布号
WO2010042410(A2)
申请公布日期
2010.04.15
申请号
WO2009US59449
申请日期
2009.10.02
申请人
APPLIED MATERIALS, INC.;DAVIS, MATTHEW F.;BAHNG, KENNETH J.;MOREY, TRAVIS;CARDUCCI, JAMES D.
发明人
DAVIS, MATTHEW F.;BAHNG, KENNETH J.;MOREY, TRAVIS;CARDUCCI, JAMES D.