发明名称 |
Radiation system and lithographic apparatus |
摘要 |
A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
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申请公布号 |
US7696492(B2) |
申请公布日期 |
2010.04.13 |
申请号 |
US20060637936 |
申请日期 |
2006.12.13 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
WASSINK ARNOUD CORNELIS;BANINE VADIM YEVGENYEVICH;IVANOV VLADIMIR VITALEVITCH;KOSHELEV KONSTANTIN NIKOLAEVITCH;CADEE THEODORUS PETRUS MARIA;KRIVTSUN VLADIMIR MIHAILOVITCH;KLUNDER DERK JAN WILFRED;VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;BROM PAUL PETER ANNA ANTONIUS;SOER WOUTER ANTHON |
分类号 |
A61N5/00;G21G5/00 |
主分类号 |
A61N5/00 |
代理机构 |
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代理人 |
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地址 |
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