| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a peripheral exposure method that simplifies an alignment process and accurately secures a peripheral exposure area parallel to a reference side. <P>SOLUTION: The peripheral exposure method includes an ultraviolet irradiation unit (31) for irradiation with ultraviolet light, and exposes a peripheral area (EA) formed at a periphery of a circuit pattern area formed on a rectangular substrate (SW) with the ultraviolet light. The method includes a holding process (S11) of holding the rectangular substrate on a process; an inclination detecting process (S13) of detecting an edge (SN1) of one side of the rectangular substrate (SW) by a detection unit (51) provided to the ultraviolet irradiation unit and calculating the inclination of the substrate from a first direction; a rotating process (S14) of rotating the rectangular substrate or the ultraviolet irradiation unit based upon an inclination detection result; a driving process (S17) of driving the ultraviolet irradiation unit and process relatively in the first direction; and an irradiation process (S18) of performing the irradiation with the ultraviolet light from the ultraviolet irradiation unit while specifying the peripheral area (EA) by detecting the edge by the inclination detection unit (51). <P>COPYRIGHT: (C)2010,JPO&INPIT |
