发明名称 DEVICE AND METHOD FOR CORRECTING DEFECT, AND PATTERN SUBSTRATE MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To reduce the time required for correcting a defect on a sample. <P>SOLUTION: According to one embodiment, an inspection and correction device 100 inspects a defect on a mask 20 and corrects the defect. The device includes: a lighting optical system for applying illuminating light from an ultraviolet laser light source 1 to the mask 20; and an enlarged projection optical system for observing the mask 20. The lighting optical system includes: a rod type integrator 3 for making the distribution of intensity of illuminating light uniform; and a condensing optical system 11 for condensing illuminating light. The rod type integrator 3 and the condensing optical system 11 are taken in and out on the optical axis. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010079136(A) 申请公布日期 2010.04.08
申请号 JP20080249579 申请日期 2008.09.29
申请人 LASERTEC CORP 发明人 KUSUSE HARUHIKO;TAKEHISA KIWAMU
分类号 G03F1/84 主分类号 G03F1/84
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