发明名称 Method of Manufacturing a Transistor, and Method of Controlling a Threshold Voltage of the Transistor
摘要 A transistor has a gate electrode, a gate insulation layer structure, a channel layer and source/drain layers. The gate insulation layer structure includes a lower gate insulation layer, a control layer for controlling a threshold voltage of the transistor, and an upper gate insulation layer. The channel layer contacts a surface of the gate insulation layer structure and vertically overlaps the gate electrode. The source/drain layers are adjacent to but not contacting the gate electrode.
申请公布号 US2010085112(A1) 申请公布日期 2010.04.08
申请号 US20090571936 申请日期 2009.10.01
申请人 JEON SANG-HUN;LEE MOON-SOOK 发明人 JEON SANG-HUN;LEE MOON-SOOK
分类号 G05F1/10;H01L21/336 主分类号 G05F1/10
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