| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a polishing pad capable of moderating the degree of abrasion and stabilizing polishing performance. <P>SOLUTION: The polishing pad includes a urethane sheet of a foam structure having a polishing surface. The urethane sheet is formed of a mixture of a polyisocyanate compound, a polyol compound, water, and a polyamine compound. Amounts of the respective components are controlled so that an F value obtained by an expression of F=-36.7×HSC-758.8×R+656×D-619×T+2587 is in a range of 100-200, wherein HSC refers to a content of hard segments, R refers to a total equivalence ratio of a total amount of a hydroxy group of the polyol compound and an amino group of the polyamine compound with respect to an isocyanate group of the polyisocyanate compound, D refers to a bulk density, and T refers to a thickness, respectively. The F value correlates with likelihood of abrasion on the polishing surface and the thickness T correlates with a service life. <P>COPYRIGHT: (C)2010,JPO&INPIT |
