发明名称 SYSTEM FOR CONTINUOUSLY USING RESIST STRIPPER LIQUID BASED ON NANOFILTRATION
摘要 <p>[PROBLEMS]To realize a system in which a resist stripper liquid used in resist stripping is regulated so as to have a resist component concentration within a certain concentration range even when the resist stripper liquid is continuously used for long without replacing it.[MEANS FOR SOLVING PROBLEMS]In stripping a positive resist with a stripper liquid, the resist components which have dissolved in the stripper liquid can be diminished by cross-flow filtration with a specific ceramic filter (5). In the resist stripping system, a resist-component-containing stripper liquid resulting from a stripping step is treated in a filtration step, and the resultant concentrated stripper liquid having a heightened resist-component concentration is suitably discharged from the system. A fresh stripper liquid is suitably added to the stripper liquid from which the resist components have been removed, and the resultant stripper liquid is reused in the stripping step.</p>
申请公布号 KR20100037037(A) 申请公布日期 2010.04.08
申请号 KR20097026214 申请日期 2008.06.27
申请人 TOAGOSEI CO., LTD. 发明人 SUMITA MASANAO;HAYASHI HIDEO
分类号 H01L21/027 主分类号 H01L21/027
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