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发明名称
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
摘要
申请公布号
KR100951971(B1)
申请公布日期
2010.04.08
申请号
KR20070086473
申请日期
2007.08.28
申请人
发明人
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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