发明名称 EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To form an accurate pattern without reducing a data processing speed even in the case of a high-density drawing pattern having a large data amount. <P>SOLUTION: A fixed form pattern CP repeatedly appearing in a drawing pattern PW is extracted from the drawing pattern PW, and a series of fixed form raster data for exposure is stored in a memory in association with paste numbers. During exposure operation, vector data of a peculiar pattern PB is converted to raster data in accordance with a relative position of an exposure area, and fixed form raster data for exposure corresponding to the relative position of the exposure area is read out from the memory. The read fixed form raster data for exposure and the peculiar raster data are combined to generate comprehensive exposure raster data. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010080777(A) 申请公布日期 2010.04.08
申请号 JP20080248940 申请日期 2008.09.26
申请人 ORC MFG CO LTD 发明人 OKUYAMA TAKASHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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