发明名称 MEMORY ELEMENT, METHOD OF MANUFACTURING THE SAME, AND MEMORY ARRAY
摘要 PROBLEM TO BE SOLVED: To solve a problem in an inclined evaporation type nanogap switch element in the prior art: the switching electric characteristics change in an ambient in the element and finally the switching characteristics are not exhibited in the element having this structure because variations are caused in electric characteristics of a large number of two electrodes due to site dependency on a wafer and dependency per wafer which appear on a distance between the two electrodes. SOLUTION: A first conductive region 135 is provided on a first hole 158 provided in a first film 150, a second conductive region 235 having a gap g between itself and the first conductive region 135 is provided on the upper part of the first hole 158, and a memory element is configured of the first conductive region 135, the second conductive region 235 and the gap g. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010080734(A) 申请公布日期 2010.04.08
申请号 JP20080248429 申请日期 2008.09.26
申请人 FUNAI ELECTRIC ADVANCED APPLIED TECHNOLOGY RESEARCH INSTITUTE INC;FUNAI ELECTRIC CO LTD 发明人 HAYASHI YUTAKA;ONO MASATOSHI;TAKAHASHI TAKESHI;MASUDA YUICHIRO;FURUTA SHIGEO
分类号 H01L27/10 主分类号 H01L27/10
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