| 发明名称 |
MOLD FOR NANOIMPRINT |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mold for nanoimprint easy to be manufactured without providing a seam, even when an area of an irregular face for transfer is wide. <P>SOLUTION: The mold for nanoimprint includes the irregular face containing a liquid crystal polysilane and formed by forming a smectic phase by orientation of the liquid crystalline polysilane. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
| 申请公布号 |
JP2010076211(A) |
申请公布日期 |
2010.04.08 |
| 申请号 |
JP20080246101 |
申请日期 |
2008.09.25 |
| 申请人 |
TOKYO INSTITUTE OF TECHNOLOGY;NIPPON OIL CORP |
发明人 |
WATANABE JUNJI;NISHIMURA RYO;SEKI TAKASHI;HIRAI TOMOO |
| 分类号 |
B29C59/02;B29C33/40;B29K83/00;H01L21/027 |
主分类号 |
B29C59/02 |
| 代理机构 |
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