| 发明名称 |
ION DEPOSITION APPARATUS |
| 摘要 |
This invention relates to a broad beam ion deposition apparatus (100) including an ion source (101), a target (102), a tillable substrate table (103) and an auxiliary port (104). The target (102) is in the form of a carousel which carries a number of targets and the ion source (101) is configured to produce a substantially rectangular section beam (105).
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| 申请公布号 |
US2010084569(A1) |
申请公布日期 |
2010.04.08 |
| 申请号 |
US20070309464 |
申请日期 |
2007.07.06 |
| 申请人 |
PROUDFOOT GARY;GEORGE CHRISTOPHER DAVID;LIMA PAULO EDURADO;GREEN GORDON ROBERT;TROWELL ROBERT KENNETH |
发明人 |
PROUDFOOT GARY;GEORGE CHRISTOPHER DAVID;LIMA PAULO EDURADO;GREEN GORDON ROBERT;TROWELL ROBERT KENNETH |
| 分类号 |
H01J37/30;H01J27/02;H01J37/08;H01J37/20 |
主分类号 |
H01J37/30 |
| 代理机构 |
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