| 摘要 |
An projection optical system for an i-line projection exposure apparatus includes positive, negative, positive, negative and positive lens units which include a lens having an Abbe number equal to or smaller than 62. 0.125≦̸NAO, −0.251<&bgr;<−0.249, 80 mm≦̸|OB1max|, 20 mm≦̸|OB2max|, |Dt/(NAO·|OB1max|)|≦̸62.0, Dt/Td≦̸0.645, 0.072≦̸|OB1max|/Td| are met, where NAO is a numerical aperture on the object plane, &bgr; is an imaging magnification, Td is a distance on an optical axis from the object plane to the image plane, Dt is a sum of thicknesses of the glass materials on the optical axis in the projection optical system, OB1max is a maximum object height on the object plane, and OB2max is a maximum image height on the image plane.
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