发明名称 |
SUBSTRATE PROCESSING APPARATUS |
摘要 |
<p>PURPOSE: A substrate processing apparatus is provided to prevent danger due to mixture of wrong gas by including a function for displaying a gas state in a gas pipe. CONSTITUTION: A substrate processing apparatus includes a state detector and a display unit operating unit(44). The state detector detects the open state of a valve installed in a gas pipe. A display unit discriminates and displays the prediction state of the gas which flows in the gas pipe by the open request state of the valve. The display unit discriminates and displays the gas state which flows in the gas pipe by opening the valve.</p> |
申请公布号 |
KR20100036204(A) |
申请公布日期 |
2010.04.07 |
申请号 |
KR20090091814 |
申请日期 |
2009.09.28 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC. |
发明人 |
YAMADA TOMOYUKI;OISHI MAMORU;KITAYAMA KANAKO |
分类号 |
H01L21/02;H01L21/205 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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