PHOTOSENSITIVE TRANSFER MATERIAL, METHOD OF FORMING RESIN PATTERN, SUBSTRATE HAVING RESIN PATTERN, DISPLAY ELEMENT, AND DISPLAY

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive transfer material having excellent followability to a photosensitive resin layer to be transferred to an uneven shape of the surface to be transferred and permits uniform development even in one-time development process when forming a resin pattern.

SOLUTION: This photosensitive transfer material includes the photosensitive resin layer with the melting viscosity at 110 °C of 10,000-30,000 Pa s on a temporary support body with the thickness of 12-40 μm.

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