| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin-film forming device and a method for forming a thin film, not needing a complicated device such as a vacuum device, and capable of forming a thin film with a uniform quality. <P>SOLUTION: The thin-film forming device forms a thin film on a base material by generating plasma at atmospheric pressure or near at atmospheric pressure. The device has a discharge-gas supply means for supplying a discharge gas, a raw material gas supply means for supplying a raw material gas, one pair of electrodes, a high-frequency power source for generating a high-frequency electric field in between the one pair of electrodes, and a control means which simultaneously performs supply starting of the discharge gas by the discharge gas supply means, supply starting of the raw material gas by the raw material gas supply means, and impression starting of high frequency voltage to an electrode by the high-frequency power source. <P>COPYRIGHT: (C)2010,JPO&INPIT |
