AN OPTICAL IMAGING WRITER SYSTEM

摘要

System and method for applying mask data patterns to substrate in a lithographs manufacturing process are disclosed. In one embodiment, the imaging system includes a plurality of spatial light modulator (SLM ) imaging units, where each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one oi more projection lens. The imaging system further includes a controllei configured to control the plurality of SLM imaging units, where the controller tunes each of the SLM imaging unit individually in writing a mask data to a substrate in a lithography manufacturing process.