发明名称 |
SUBSTRATE PROCESSING APPARATUS |
摘要 |
A gas flow of a gas pipe is indicated before an electromagnetic valve is actually opened, so that the electromagnetic valve can be prevented from being opened or closed by a wrong manipulation or hazards caused by undesired mixing of gases can be avoided so as to improve safety. The substrate processing apparatus includes a state detection unit configured to detect an opening/closing request state and an opening/closing state of a valve installed at a gas pipeline; and a indication unit configured to indicate a gas flow state of the gas pipeline predicted according to the opening/closing request state and a gas flow state of the gas pipeline when the valve is opened, in a way that each state is distinguished.
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申请公布号 |
US2010078128(A1) |
申请公布日期 |
2010.04.01 |
申请号 |
US20090568175 |
申请日期 |
2009.09.28 |
申请人 |
HITACHI-KOKUSAI ELECTRIC, INC. |
发明人 |
YAMADA TOMOYUKI;OISHI MAMORU;KITAYAMA KANAKO |
分类号 |
H01L21/465;B05C11/00 |
主分类号 |
H01L21/465 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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