发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 A gas flow of a gas pipe is indicated before an electromagnetic valve is actually opened, so that the electromagnetic valve can be prevented from being opened or closed by a wrong manipulation or hazards caused by undesired mixing of gases can be avoided so as to improve safety. The substrate processing apparatus includes a state detection unit configured to detect an opening/closing request state and an opening/closing state of a valve installed at a gas pipeline; and a indication unit configured to indicate a gas flow state of the gas pipeline predicted according to the opening/closing request state and a gas flow state of the gas pipeline when the valve is opened, in a way that each state is distinguished.
申请公布号 US2010078128(A1) 申请公布日期 2010.04.01
申请号 US20090568175 申请日期 2009.09.28
申请人 HITACHI-KOKUSAI ELECTRIC, INC. 发明人 YAMADA TOMOYUKI;OISHI MAMORU;KITAYAMA KANAKO
分类号 H01L21/465;B05C11/00 主分类号 H01L21/465
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