发明名称 |
SEMICONDUCTOR DEVICE FABRICATION EQUIPMENT WITH SHOWERHEAD |
摘要 |
PURPOSE: A device with a shower head for manufacturing a semiconductor device is provided to improve the process uniformity of a substrate by supplying the process gas with a preset ratio by removing the linearity of the inputted gas. CONSTITUTION: A reaction gas shower head module(410) includes an upper plate(541), a lower plate(549), and a plurality of reaction gas spray tubes(451,551). A purge gas shower head module(610) is arranged under the reaction gas shower head module. A cooling jacket(710) is arranged under the purge gas shower head module and includes a reaction gas spray tube guide(781) passing through a reaction gas spray tube(451). The reaction gas spray tube guide has the larger diameter than the reaction gas spry tube to pass the purge gas through a gap between the inner walls and the outer wall of the reaction gas spray tube.
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申请公布号 |
KR20100033991(A) |
申请公布日期 |
2010.03.31 |
申请号 |
KR20100015324 |
申请日期 |
2010.02.19 |
申请人 |
KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY;PIEZONICS CO., LTD. |
发明人 |
BYUN, CHUL SOO;HAN, MAN CHEOL |
分类号 |
H01L21/205;H01L21/3065 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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