发明名称 |
Debris prevention system, radiation system, and lithographic apparatus |
摘要 |
A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.
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申请公布号 |
US7687788(B2) |
申请公布日期 |
2010.03.30 |
申请号 |
US20070826525 |
申请日期 |
2007.07.16 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;SOER WOUTER ANTHON;GIELISSEN KURT |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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