发明名称 |
Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
摘要 |
A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated.
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申请公布号 |
US7687117(B2) |
申请公布日期 |
2010.03.30 |
申请号 |
US20080346917 |
申请日期 |
2008.12.31 |
申请人 |
OERLIKON TRADING AG, TRUEBBACH |
发明人 |
SCHMITT JACQUES;SANSONNENS LAURENT;ELYAAKOUBI MUSTAPHA;IRZYK MICHAEL |
分类号 |
B05D1/06;C23C16/00;H01J37/32 |
主分类号 |
B05D1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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