发明名称 |
PLASMA CLEANING APPARATUS FOR MOLD CHASE |
摘要 |
PURPOSE: A plasma cleaning apparatus for a mold chase washes a mold chase to a reactive gas of a plasma state. A mold chase is washed uniformly. CONSTITUTION: A plasma cleaning apparatus(1000) for a mold chase comprises a reaction chamber(100), a reaction gas supply area(200), a RF(Radio Frequency) generator(300), a RF matching box(400) and a vacuum pump(500). The reaction chamber has the space for the mold chase. Supplies the reactive gas to a gas supply area is the upper side of the mold chase. The vacuum pump exhausts the reactive gas. The reaction gas supply area individually supplies a reactive gas according to a longitudinal direction of a mold chase.
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申请公布号 |
KR20100033043(A) |
申请公布日期 |
2010.03.29 |
申请号 |
KR20080092002 |
申请日期 |
2008.09.19 |
申请人 |
AMKOR TECHNOLOGY KOREA, INC. |
发明人 |
KIM, DO HEON;KIM, YOON SU;KIM, SEON WOONG;SONG, KI DOO |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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