发明名称 PLASMA CLEANING APPARATUS FOR MOLD CHASE
摘要 PURPOSE: A plasma cleaning apparatus for a mold chase washes a mold chase to a reactive gas of a plasma state. A mold chase is washed uniformly. CONSTITUTION: A plasma cleaning apparatus(1000) for a mold chase comprises a reaction chamber(100), a reaction gas supply area(200), a RF(Radio Frequency) generator(300), a RF matching box(400) and a vacuum pump(500). The reaction chamber has the space for the mold chase. Supplies the reactive gas to a gas supply area is the upper side of the mold chase. The vacuum pump exhausts the reactive gas. The reaction gas supply area individually supplies a reactive gas according to a longitudinal direction of a mold chase.
申请公布号 KR20100033043(A) 申请公布日期 2010.03.29
申请号 KR20080092002 申请日期 2008.09.19
申请人 AMKOR TECHNOLOGY KOREA, INC. 发明人 KIM, DO HEON;KIM, YOON SU;KIM, SEON WOONG;SONG, KI DOO
分类号 H01L21/302 主分类号 H01L21/302
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