发明名称 APPARATUS FOR TEST OF SUBSTRATE IN IMPRINT PROCESS
摘要 PURPOSE: A substrate test apparatus for an imprint process is provided to accurately test the contact uniformity in the imprint process by measuring the uniformity of resin thickness between a substrate and a mold. CONSTITUTION: A substrate test apparatus(100) for an imprint process comprises a light source(10), a suction plate(30), a mold glass, and an imaging unit(70). The light source projects light beam and includes a diffuser which evenly diffuses the light beam. The suction plate supports and holds a substrate. The mold glass is arranged between the substrate and the light source. The imaging unit acquires partial light reflected from a half mirror layer and an interference image.
申请公布号 KR100950071(B1) 申请公布日期 2010.03.26
申请号 KR20090068558 申请日期 2009.07.27
申请人 KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION 发明人 JANG, SI YOUL;SHIN, DONG HYUK;LEE, JEA GAB
分类号 G01N21/55;G02F1/13 主分类号 G01N21/55
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