发明名称 |
APPARATUS FOR TEST OF SUBSTRATE IN IMPRINT PROCESS |
摘要 |
PURPOSE: A substrate test apparatus for an imprint process is provided to accurately test the contact uniformity in the imprint process by measuring the uniformity of resin thickness between a substrate and a mold. CONSTITUTION: A substrate test apparatus(100) for an imprint process comprises a light source(10), a suction plate(30), a mold glass, and an imaging unit(70). The light source projects light beam and includes a diffuser which evenly diffuses the light beam. The suction plate supports and holds a substrate. The mold glass is arranged between the substrate and the light source. The imaging unit acquires partial light reflected from a half mirror layer and an interference image.
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申请公布号 |
KR100950071(B1) |
申请公布日期 |
2010.03.26 |
申请号 |
KR20090068558 |
申请日期 |
2009.07.27 |
申请人 |
KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION |
发明人 |
JANG, SI YOUL;SHIN, DONG HYUK;LEE, JEA GAB |
分类号 |
G01N21/55;G02F1/13 |
主分类号 |
G01N21/55 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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