发明名称 ION IMPLANTATION METHOD, METHOD OF PRODUCING SOLID-STATE IMAGING DEVICE, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS
摘要 PURPOSE: An ion injection method, a manufacturing method of a solid imaging apparatus, and a solid imaging apparatus and an electronic device are provided to adopt an ion implantation mask. The pixel size of the solid imaging apparatus can be reduced. CONSTITUTION: An ion implantation is multiple times enforced using a plurality of ion implantation masks. The ion implantation mask comprises a main mask portions(23), and a bridge section(24) and an opening(25). The master mask cattail is each other connected with bridge sections. A plurality of ion implantation masks is combined and a plurality of cyclic type ion implantation regions is formed.
申请公布号 KR20100032837(A) 申请公布日期 2010.03.26
申请号 KR20090088076 申请日期 2009.09.17
申请人 SONY CORPORATION 发明人 MABUCHI KEIJI
分类号 H01L27/146;H01L21/265;H01L21/266 主分类号 H01L27/146
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