发明名称 |
ION IMPLANTATION METHOD, METHOD OF PRODUCING SOLID-STATE IMAGING DEVICE, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS |
摘要 |
PURPOSE: An ion injection method, a manufacturing method of a solid imaging apparatus, and a solid imaging apparatus and an electronic device are provided to adopt an ion implantation mask. The pixel size of the solid imaging apparatus can be reduced. CONSTITUTION: An ion implantation is multiple times enforced using a plurality of ion implantation masks. The ion implantation mask comprises a main mask portions(23), and a bridge section(24) and an opening(25). The master mask cattail is each other connected with bridge sections. A plurality of ion implantation masks is combined and a plurality of cyclic type ion implantation regions is formed.
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申请公布号 |
KR20100032837(A) |
申请公布日期 |
2010.03.26 |
申请号 |
KR20090088076 |
申请日期 |
2009.09.17 |
申请人 |
SONY CORPORATION |
发明人 |
MABUCHI KEIJI |
分类号 |
H01L27/146;H01L21/265;H01L21/266 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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