| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for removing a halogen gas, which can suppress the heat generation of a removing agent due to adsorption heat generated by the gases to be treated and reduce the generation of solid waste after treatment, can also be applied to the gases to be treated containing a halogen gas at a low concentration, and is excellent in efficiency for removing the halogen gas, to provide a removing agent, and to provide a method for producing a semiconductor using the removal method. <P>SOLUTION: The method for removing a halogen gas by contacting gases to be treated containing the halogen gas with a removing agent comprising granules, wherein the granules contain an alkaline metal hydrogencarbonate and/or carbonate, a carbonaceous material, a hydroxide of alkaline earth metal, and a hydrate of an alkaline earth metal halide. The removing agent comprising the granules and the method for producing a semiconductor using the removal method are also provided herein. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
