发明名称 MANUFACTURING METHOD OF MICROLENS ARRAY AND MANUFACTURING METHOD OF PHOTOELECTRIC CONVERSION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To obtain a microlens array where a plurality of microlenses each having an aspherical surface all over the surface thereof are arrayed even if reducing a gap between the adjoining microlenses. Ž<P>SOLUTION: The method of manufacturing the microlens array by means of an exposure device includes: a coating process to coat a substrate where a plurality of pixel areas are arrayed with photosensitive resin; a first exposure process to expose the photosensitive resin by means of a first original plate for forming the exposure distribution according to the shape of the microlens for each of the plurality of pixel areas coated with the photosensitive resin; a developing process to form a pattern by developing the exposed photosensitive resin; a second exposure process to expose the pattern by means of a second original plate for masking the inner part of each of the plurality of pixel areas and exposing the outer part after the developing process; and a heating process to heat the pattern after the second exposure process, and to form the plurality of microlenses in the plurality of pixel areas. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010066727(A) 申请公布日期 2010.03.25
申请号 JP20080235591 申请日期 2008.09.12
申请人 CANON INC 发明人 HIRAYAMA SATOSHI;OGAWA KIYOAKI
分类号 G02B3/00;H01L27/14 主分类号 G02B3/00
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