发明名称 FIN FIELD EFFECT TRANSISTOR (FINFET)
摘要 <p>A Fin FET whose fin (12) has an upper portion (30) doped with a first conductivity type and a lower portion (32) doped with a second conductivity type, wherein the junction (34) between the upper portion (30) and the lower portion (32) acts as a diode; and the FinFET further comprises: at least one layer (26, 28) of high-k dielectric material (for example Si3 N4 ) adjacent at least one side of the fin (12) for redistributing a potential drop more evenly over the diode, compared to if the at least one layer of high-k dielectric material were not present, when the upper portion (30) is connected to a first potential and the lower portion (32) is connected to a second potential thereby providing the potential drop across the junction (34). Examples of the k value for the high-k dielectric material are k = 5, k = 7.5, and k = 20.</p>
申请公布号 WO2010032174(A1) 申请公布日期 2010.03.25
申请号 WO2009IB53963 申请日期 2009.09.10
申请人 NXP B.V.;DOORNBOS, GERBEN;LANDER, ROBERT 发明人 DOORNBOS, GERBEN;LANDER, ROBERT
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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