发明名称 ARRANGEMENT METHOD OF LIQUID MATERIAL AND MANUFACTURING METHOD OF ELECTROOPTICAL APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To produce an arrangement pattern for arranging liquid material in an area where the liquid material is discharged, with simple treatment. <P>SOLUTION: The arrangement method of liquid material for arranging the liquid material in the area Q where the liquid material is discharged, on a substrate B by relatively moving a plurality of nozzles 52 and the substrate B, includes: a nozzle inspection process for inspecting an ejection state of the nozzle 52; a first arrangement pattern preparing process for preparing a first arrangement pattern formed by a dot d in which the liquid material lands in accordance with a nozzle interval in the nozzle array 52a direction and an ejection interval in the relative movement direction, within the area Q where the liquid material is discharged; a second arrangement pattern preparing process for preparing a second arrangement pattern formed by erasing a prescribed number of dots d from the first arrangement pattern; and a liquid material arranging process for arranging the liquid material based on the second arrangement pattern, wherein the first arrangement pattern is prepared in the largest range where the liquid material can land within the area Q where the liquid material is discharged based on a detection result of the nozzle detection process. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010063957(A) 申请公布日期 2010.03.25
申请号 JP20080230612 申请日期 2008.09.09
申请人 SEIKO EPSON CORP 发明人 KINOSHITA TOYOTARO;ARIGA KAZUMI
分类号 B05D1/26;B05D3/00;G02B5/20;G02F1/1335 主分类号 B05D1/26
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