发明名称 PHOTONIC MILLING USING DYNAMIC BEAM ARRAYS
摘要 A laser processing system includes a beam positioning system to align beam delivery coordinates relative to a workpiece. The beam positioning system generates position data corresponding to the alignment. The system also includes a pulsed laser source and a beamlet generation module to receive a laser pulse from the pulsed laser source. The beamlet generation module generates a beamlet array from the laser pulse. The beamlet array includes a plurality of beamlet pulses. The system further includes a beamlet modulator to selectively modulate the amplitude of each beamlet pulse in the beamlet array, and beamlet delivery optics to focus the modulated beamlet array onto one or more targets at locations on the workpiece corresponding to the position data.
申请公布号 WO2010033723(A2) 申请公布日期 2010.03.25
申请号 WO2009US57346 申请日期 2009.09.17
申请人 ELECTRO SCIENTIFIC INDUSTRIES, INC.;BAIRD, BRIAN W.;BRULAND, KELLY J.;HAINSEY, ROBERT 发明人 BAIRD, BRIAN W.;BRULAND, KELLY J.;HAINSEY, ROBERT
分类号 H01L21/82;H01L21/8242 主分类号 H01L21/82
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