发明名称 FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD AND COMPUTER READABLE STORAGE MEDIUM
摘要 PURPOSE: A film forming device, a film forming method, and a computer readable memory medium are provided to properly deposit a molecular layer by reducing the mixture of a raw gas. CONSTITUTION: A film forming device(10) includes a plurality of first planar units and second planar units. The first planar unit is installed inside a cylindrical container and has an opening. The second planar unit reciprocates inside the opening. A first gas flows through a first path. A second gas flows through a second path. The substrate is maintained between a pair of the second planar units.
申请公布号 KR20100032328(A) 申请公布日期 2010.03.25
申请号 KR20090087282 申请日期 2009.09.16
申请人 TOKYO ELECTRON LIMITED 发明人 KATO HITOSHI;TAKEUCHI YASUSHI
分类号 H01L21/20;H01L21/02 主分类号 H01L21/20
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