| 摘要 |
Structures and methods of forming through substrate vias are disclosed. In one embodiment, the method includes forming a through substrate opening from a top surface of a substrate, the top surface including active devices, and filling the first through substrate opening with an ancillary material. A conductive capping layer is formed over the ancillary material to cap the first through substrate opening. The substrate is thinned from a back surface to expose a portion of the ancillary material, the back surface being opposite to the top surface. The ancillary material is removed from the first through substrate opening, and a conductor is formed by filling a conductive material into the through substrate opening. |
