| 摘要 |
PROBLEM TO BE SOLVED: To solve a problem in a multi-beam type charged particle beam apparatus as well as a projection charged particle beam apparatus that, although it is essential to have outer-axis aberration correction to realize both inspection speed and resolution, an off-axial aberration corrector needs to construct a number of multi-poles and prepare power sources by the number of the multi-poles, and further, aberration correction can not be achieved so long as displacement and designing errors of the multi-poles are not restrained or symmetry of multipolar fields is not well maintained, so that it is extremely difficult to carry out adjustment of voltage or current of each power source, which leads to lack of practicality. SOLUTION: In the multi-beam type charged particle beam apparatus, an electrostatic mirror is arranged in an electronic optical system, whereby, an aberration corrector is structured with the number of multi-poles cut down to half of the prior art. Thus, it is possible to automatically create multipolar fields with symmetry maintained, resulting in easy adjustment. COPYRIGHT: (C)2010,JPO&INPIT
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