发明名称 Horizontal chalcogenide element defined by a pad for use in solid-state memories
摘要 A memory cell structure includes a substrate having a bottom electrode at least partially disposed within the substrate; a pad disposed at least partially over the substrate; a phase change element having a chalcogenide material, disposed at least partially over the substrate and adjacent to the pad, the phase change element being adjacent and operatively coupled to the bottom electrode; and a top electrode operatively coupled to the phase change element. Moreover, the pad is formed by a method including depositing a first material layer over the substrate, etching the first material layer to form a pad strip and to expose the bottom electrode, and etching the pad strip to from the pad.
申请公布号 US7683360(B2) 申请公布日期 2010.03.23
申请号 US20060378904 申请日期 2006.03.17
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 CHEN YI-CHOU;LUNG HSIANG-LAN;LIU RUICHEN
分类号 H01L29/04;G11C16/02;H01L27/24;H01L29/00;H01L45/00 主分类号 H01L29/04
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