发明名称 |
OPTICAL GRID FOR HIGH PRECISION AND HIGH RESOLUTION METHOD OF WAFER SCALE NANOFABRICATION |
摘要 |
A wafer-scale nano-metrology system (10) for sensing position of a nanofabrication element (16) when illuminated by a patterned optical projection defining a grid or position measuring gauge includes a frequency stabilized laser emitter (12) configured to generate a laser emission at a selected frequency, where the laser emission forms a diverging beam configured to illuminate a selected area occupied by a target fabrication object (18) having a proximal surface. An optical pattern generator (14) is illuminated by laser (12) and generates a patterned optical projection grid or gauge for projection upon the target fabrication object (18). A movable tool or nanofabrication element (16) carries an optical sensor array (50), and the sensor array detect at least a portion of the optical projection grid, and, in response to that detection, generates grid position data for use in controlling the position of the tool (16). |
申请公布号 |
WO2010030698(A1) |
申请公布日期 |
2010.03.18 |
申请号 |
WO2009US56400 |
申请日期 |
2009.09.09 |
申请人 |
CORNELL UNIVERSITY;LAL, AMIT;YOSHIMIZU, NORIMASA |
发明人 |
LAL, AMIT;YOSHIMIZU, NORIMASA |
分类号 |
B23Q17/09 |
主分类号 |
B23Q17/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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