发明名称 SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <p>A surface position detecting apparatus according to an aspect of the present invention has a light-sending optical system (4-11) which makes first light and second light from first and second patterns incident at different incidence angles to a predetermined surface (Wa) to project an intermediate image of the first pattern and an intermediate image of the second pattern onto the predetermined surface; a light-receiving optical system (31-24) which guides the first light and the second light reflected by the predetermined surface, to a first observation surface (23Aa) and to a second observation surface (23Ba), respectively, to form an observation image of the first pattern and an observation image of the second pattern on the first and second observation surfaces; and a detecting section (23-21, PR) which detects a piece of position information of the observation image of the first pattern and a piece of position information of the observation image of the second pattern and calculates a surface position of the predetermined surface, based on the pieces of position information. The light-sending optical system has a sending-side reflecting section (11) which reflects the second light having passed via sending-side common optical members (5-8), an even number of times to make the second light incident at the incidence angle smaller than that of the first light to the predetermined surface.</p>
申请公布号 WO2010029860(A1) 申请公布日期 2010.03.18
申请号 WO2009JP65026 申请日期 2009.08.21
申请人 NIKON CORPORATION;HIDAKA, YASUHIRO 发明人 HIDAKA, YASUHIRO
分类号 G03F9/00 主分类号 G03F9/00
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