| 摘要 |
PURPOSE: A substrate processing apparatus is provided to prevent an exhausted gas to a gas exhaust unit from dispreading into a process chamber without installing a vacuum pump in the downstream of a bypass pipeline. CONSTITUTION: A substrate(200) is transferred into a process chamber(201). Gas supply units(150, 160, 170) supply a process gas from process gas sources(153, 163, 173) to the process chamber. A gas exhaust unit(231) exhausts the atmosphere of the process chamber. A vacuum is serially installed in the gas exhaust unit. A bypass pipeline connects the gas supply units and a gas exhaust unit without the interposition of the process chamber.
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